Place of Origin: | China |
Brand Name: | PAM-XIAMEN |
Minimum Order Quantity: | 1-10,000pcs |
---|---|
Price: | By Case |
Delivery Time: | 5-50 working days |
Payment Terms: | T/T |
Supply Ability: | 10,000 wafers/month |
Name: | 4H N Type SIC Wafer | Grade: | Research Grade |
---|---|---|---|
Description: | Single Crystal Silicon Carbide Wafer | Size: | 10mm X 10mm |
Keywords: | SiC Wafer | Application: | Electronic Industry |
Off Axis: | 4°or 8° Toward <11-20>± 0.5° | Primary Flat Orientation: | Parallel {1-100} ± 5° |
High Light: | semi standard wafer,4h sic wafer |
Off-Axis 4H N Type SiC Wafer Material, Research Grade , 10mm x 10mm
SiC Crystal Structure
SiC Crystal has many different crystal structures,which is called polytypes.The most common polytypes of SiC presently being developed for electronics are the cubic 3C-SiC, the hexagonal 4H-SiC and 6H-SiC, and the rhombohedral 15R-SiC. These polytypes are characterized by the stacking sequence of the biatom layers of the SiC structure.For more details, please enquire our engineer team.
Please contact us for more information
SILICON CARBIDE MATERIAL PROPERTIES
Polytype | Single Crystal 4H | Single Crystal 6H |
Lattice Parameters | a=3.076 Å | a=3.073 Å |
c=10.053 Å | c=15.117 Å | |
Stacking Sequence | ABCB | ABCACB |
Band-gap | 3.26 eV | 3.03 eV |
Density | 3.21 · 103 kg/m3 | 3.21 · 103 kg/m3 |
Therm. Expansion Coefficient | 4-5×10-6/K | 4-5×10-6/K |
Refraction Index | no = 2.719 | no = 2.707 |
ne = 2.777 | ne = 2.755 | |
Dielectric Constant | 9.6 | 9.66 |
Thermal Conductivity | 490 W/mK | 490 W/mK |
Break-Down Electrical Field | 2-4 · 108 V/m | 2-4 · 108 V/m |
Saturation Drift Velocity | 2.0 · 105 m/s | 2.0 · 105 m/s |
Electron Mobility | 800 cm2/V·S | 400 cm2/V·S |
hole Mobility | 115 cm2/V·S | 90 cm2/V·S |
Mohs Hardness | ~9 | ~9 |
4H N Type SiC Wafer, Research Grade,10mm x 10mm
SUBSTRATE PROPERTY | S4H-51-N-PWAM-330 S4H-51-N-PWAM-430 | |
Description | Research Grade 4H SiC Substrate | |
Polytype | 4H | |
Diameter | (50.8 ± 0.38) mm | |
Thickness | (250 ± 25) μm (330 ± 25) μm (430 ± 25) μm | |
Carrier Type | n-type | |
Dopant | Nitrogen | |
Resistivity (RT) | 0.012 – 0.0028 Ω·cm | |
Surface Roughness | < 0.5 nm (Si-face CMP Epi-ready); <1 nm (C- face Optical polish) | |
FWHM | <50 arcsec | |
Micropipe Density | A+≤1cm-2 A≤10cm-2 B≤30cm-2 C≤50cm-2 D≤100cm-2 | |
Surface Orientation | ||
On axis | <0001>± 0.5° | |
Off axis | 4°or 8° toward <11-20>± 0.5° | |
Primary flat orientation | Parallel {1-100} ± 5° | |
Primary flat length | 16.00 ± 1.70) mm | |
Secondary flat orientation | Si-face:90° cw. from orientation flat ± 5° | |
C-face:90° ccw. from orientation flat ± 5° | ||
Secondary flat length | 8.00 ± 1.70 mm | |
Surface Finish | Single or double face polished | |
Packaging | Single wafer box or multi wafer box | |
Usable area | ≥ 90 % | |
Edge exclusion | 1 mm |
SiC MicroElectromechanical Systems (MEMS) and Sensors
Unfortunately, the same properties that make SiC more durable than silicon also make SiC more difficult to micromachine. Approaches to fabricating harsh-environment MEMS structures in SiC and prototype SiC-MEMS results obtained to date are reviewed in References 124 and 190. The inability to perform fine-patterned etching of single-crystal 4H- and 6H-SiC with wet chemicals (Section 5.5.4) makes micromachining of this electronic-grade SiC more difficult. Therefore, the majority of SiC micromachining to date has been implemented in electrically inferior heteroepitaxial 3C-SiC and polycrystalline SiC deposited on silicon wafers. Variations of bulk micromachining, surface micromachining, and micromolding techniques have been used to fabricate a wide variety of micromechanical structures, including resonators and micromotors. A standardized SiC on silicon wafer micromechanical fabrication process foundry service, which enables users to realize their own application-specific SiC micromachined devices while sharing wafer space and cost with other users, is commercially available .
As discussed in Section 5.3.1, a primary application of SiC harsh-environment sensors is to enable active monitoring and control of combustion engine systems to improve fuel efficiency while reducing pollution. Toward this end, SiC’s high-temperature capabilities have enabled the realization of catalytic metal–SiC and metal-insulator–SiC prototype gas sensor structures with great promise for emission monitoring applications and fuel system leak detection . High-temperature operation of these structures, not possible with silicon, enables rapid detection of changes in hydrogen and hydrocarbon content to sensitivities of parts per million in very small-sized sensors that could easily be placed unobtrusively on an engine without the need for cooling. However, further improvements to the reliability, reproducibility, and cost of SiC-based gas sensors are needed before these systems will be ready for widespread use in consumer automobiles and aircraft. In general, the same can be said for most SiC MEMS, which will not achieve widespread beneficial system insertion until high reliability in harsh environments is assured via further technology development.
About Us
Responsibility is the assurance of quality, and quality is the life of corporation. We are looking forward to long term cooperation with customers, we will make best service and after sales service for all of our customers. If you have any inquiry, please don’t hesitate to contact us. We will reply you at the first time as we can.
After years of development, we have established perfect sales network and integrated after-sale service system at domestic and abroad, which enables the company to provide timely, accurate and efficient services, and won good customer reputations. The products are sold all over in China and exported to more than 30 countries and regions such as Europe, America, Southeast Asia, South America, Middle East and Africa. The production, sales volume and scale are all ranked first in the same industry.
4 Inch Indium Phosphide Wafer P Type Test Grade InP Epi Ready Wafer
Single Crystal Indium Phosphide Wafer High Purity 4 Inch Prime Grade
Fe Doped InP Test Grade Wafer 4" Semi Insulating Optical Sensing Application
2 Inch Gallium Nitride Wafer Bulk GaN Substrates For LED HEMT Structure
2 Inch GaN Gallium Nitride Substrates Freestanding High Frequency Devices Use
2 Inch Bulk U Gallium Nitride Wafer Epi Ready Wafer For GaN Laser Diode
6H N Type SiC Wafer Dummy Grade C 0001 Bulk Crystal Growth <50 Arcsec FWHM
On Axis Sic Silicon Carbide Wafer 4 Deg Off 4H N Type Production Grade
Research Grade Silicon Carbide Wafer 6H SiC Semi Standard Wafer Cmp Polished